Semiconductor Industry Air Emissions Standards Announcedair1999
「Semiconductor Industry Air Emissions Standards Announcedair1999」於資料集「Environmental Policy Monthly」由單位「行政院環境保護署」的楊先生所提供，聯繫電話是(02)23117722#2217,(02)23117722#2216，最近更新時間為：2022-01-15 01:13:03。 欄位編號的內容是296 ， 欄位標題的內容是Semiconductor Industry Air Emissions Standards Announced ， 欄位摘要的內容是On January 6 1999, air pollution emission standards for the semiconductor industry were announced by the EPA. The standards, which are divided into those for emission quantities and reduction amounts, will go into effect July 1, 2000 for existing facilities.
Following a year of discussion and give-and-take with the semiconductor industry, the EPA finally announced the Air Pollution Emission Standards for the Semiconductor Manufacturing Industry on January 6, 1999.
According to the announcement, the standards define the target industry scope as comprising integrated circuit wafer manufacturers, wafer packaging firms, wafer-stacking, semiconductor masking firms, and circuit frame manufacturers. Targeted pollutants include volatile organic compounds (VOCs), trichloroethylene, nitric acid, hydrochloric acid, phosphoric acid, hydrofluoric acid, and sulfuric acid. The emission standards comprise standards for both emission reduction rates and total factory emissions (see accompanying table).
In November of last year, targeted firms had expressed to the EPA their concerns over the standards' requirements for installing VOC concentration detection equipment. They argued that these requirements created difficulty for them because this type of air pollution detection equipment was not yet available on the market.
Semiconductor firms also commented that the standards placed an excessive investment burden on smaller manufacturers thereby weakening their competitiveness. They expressed the hope that the EPA would give targeted firms a buffer period by extending the implementation date of air pollution controls. At the time, the EPA took industry's request into serious consideration.
As a result, the control targets of the emission standards were defined as larger scale manufacturers, and the implementation date was extended. The standards stipulate that existing facilities have three months from the date of announcement to file pollution control plans with local-level competent authorities. The EPA has also set July 1, 2000, as the date related emission standards and monitoring and reporting requirements will become effective.
Semiconductor Industry Air Pollution Control Standards
Air pollutants
Emission standards
VOCs
Emissions reductions greater than 90% or total factory emissions less than 0.6 kg/hr (according to methane calculation basis)
Tricholoroethylene
Emissions reductions greater than 90% or total factory emissions less than 0.02 kg/hr.
Nitric acid, hydrochloric acid, phosphoric acid, HF acid
Emissions reductions greater than 95% or total factory emissions less than 0.6 kg/hr.
Sulfuric acid
Emissions reductions greater than 95% or total factory emissions less than 0.1 kg/hr.
Note:
Because facilities that use wet scrubber technology to treat waste gas from nitric acid, hydrochloric acid, phosphoric acid, HF acid, and sulfuric acid cannot prove compliance with the above stated standards, they should meet other process requirements. ， 欄位全文的內容是On January 6 1999, air pollution emission standards for the semiconductor industry were announced by the EPA. The standards, which are divided into those for emission quantities and reduction amounts, will go into effect July 1, 2000 for existing facilities.
Following a year of discussion and give-and-take with the semiconductor industry, the EPA finally announced the Air Pollution Emission Standards for the Semiconductor Manufacturing Industry on January 6, 1999.
According to the announcement, the standards define the target industry scope as comprising integrated circuit wafer manufacturers, wafer packaging firms, wafer-stacking, semiconductor masking firms, and circuit frame manufacturers. Targeted pollutants include volatile organic compounds (VOCs), trichloroethylene, nitric acid, hydrochloric acid, phosphoric acid, hydrofluoric acid, and sulfuric acid. The emission standards comprise standards for both emission reduction rates and total factory emissions (see accompanying table).
In November of last year, targeted firms had expressed to the EPA their concerns over the standards' requirements for installing VOC concentration detection equipment. They argued that these requirements created difficulty for them because this type of air pollution detection equipment was not yet available on the market.
Semiconductor firms also commented that the standards placed an excessive investment burden on smaller manufacturers thereby weakening their competitiveness. They expressed the hope that the EPA would give targeted firms a buffer period by extending the implementation date of air pollution controls. At the time, the EPA took industry's request into serious consideration.
As a result, the control targets of the emission standards were defined as larger scale manufacturers, and the implementation date was extended. The standards stipulate that existing facilities have three months from the date of announcement to file pollution control plans with local-level competent authorities. The EPA has also set July 1, 2000, as the date related emission standards and monitoring and reporting requirements will become effective.
Semiconductor Industry Air Pollution Control Standards
Air pollutants
Emission standards
VOCs
Emissions reductions greater than 90% or total factory emissions less than 0.6 kg/hr (according to methane calculation basis)
Tricholoroethylene
Emissions reductions greater than 90% or total factory emissions less than 0.02 kg/hr.
Nitric acid, hydrochloric acid, phosphoric acid, HF acid
Emissions reductions greater than 95% or total factory emissions less than 0.6 kg/hr.
Sulfuric acid
Emissions reductions greater than 95% or total factory emissions less than 0.1 kg/hr.
Note:
Because facilities that use wet scrubber technology to treat waste gas from nitric acid, hydrochloric acid, phosphoric acid, HF acid, and sulfuric acid cannot prove compliance with the above stated standards, they should meet other process requirements. ， 欄位年度的內容是1999 ， 欄位月份的內容是2 ， 欄位卷的內容是2 ， 欄位期的內容是8 ， 欄位順序的內容是1 ， 欄位倒序的內容是2 ， 欄位分類的內容是air ， 欄位標題2的內容是Semiconductor Industry Air Emissions Standards Announced ， 欄位檔案位置的內容是print/V2/V2-08 。
編號
296
標題
Semiconductor Industry Air Emissions Standards Announced
摘要
On January 6 1999, air pollution emission standards for the semiconductor industry were announced by the EPA. The standards, which are divided into those for emission quantities and reduction amounts, will go into effect July 1, 2000 for existing facilities. Following a year of discussion and give-and-take with the semiconductor industry, the EPA finally announced the Air Pollution Emission Standards for the Semiconductor Manufacturing Industry on January 6, 1999. According to the announcement, the standards define the target industry scope as comprising integrated circuit wafer manufacturers, wafer packaging firms, wafer-stacking, semiconductor masking firms, and circuit frame manufacturers. Targeted pollutants include volatile organic compounds (VOCs), trichloroethylene, nitric acid, hydrochloric acid, phosphoric acid, hydrofluoric acid, and sulfuric acid. The emission standards comprise standards for both emission reduction rates and total factory emissions (see accompanying table). In November of last year, targeted firms had expressed to the EPA their concerns over the standards' requirements for installing VOC concentration detection equipment. They argued that these requirements created difficulty for them because this type of air pollution detection equipment was not yet available on the market. Semiconductor firms also commented that the standards placed an excessive investment burden on smaller manufacturers thereby weakening their competitiveness. They expressed the hope that the EPA would give targeted firms a buffer period by extending the implementation date of air pollution controls. At the time, the EPA took industry's request into serious consideration. As a result, the control targets of the emission standards were defined as larger scale manufacturers, and the implementation date was extended. The standards stipulate that existing facilities have three months from the date of announcement to file pollution control plans with local-level competent authorities. The EPA has also set July 1, 2000, as the date related emission standards and monitoring and reporting requirements will become effective. Semiconductor Industry Air Pollution Control Standards Air pollutants Emission standards VOCs Emissions reductions greater than 90% or total factory emissions less than 0.6 kg/hr (according to methane calculation basis) Tricholoroethylene Emissions reductions greater than 90% or total factory emissions less than 0.02 kg/hr. Nitric acid, hydrochloric acid, phosphoric acid, HF acid Emissions reductions greater than 95% or total factory emissions less than 0.6 kg/hr. Sulfuric acid Emissions reductions greater than 95% or total factory emissions less than 0.1 kg/hr. Note: Because facilities that use wet scrubber technology to treat waste gas from nitric acid, hydrochloric acid, phosphoric acid, HF acid, and sulfuric acid cannot prove compliance with the above stated standards, they should meet other process requirements.
全文
On January 6 1999, air pollution emission standards for the semiconductor industry were announced by the EPA. The standards, which are divided into those for emission quantities and reduction amounts, will go into effect July 1, 2000 for existing facilities. Following a year of discussion and give-and-take with the semiconductor industry, the EPA finally announced the Air Pollution Emission Standards for the Semiconductor Manufacturing Industry on January 6, 1999. According to the announcement, the standards define the target industry scope as comprising integrated circuit wafer manufacturers, wafer packaging firms, wafer-stacking, semiconductor masking firms, and circuit frame manufacturers. Targeted pollutants include volatile organic compounds (VOCs), trichloroethylene, nitric acid, hydrochloric acid, phosphoric acid, hydrofluoric acid, and sulfuric acid. The emission standards comprise standards for both emission reduction rates and total factory emissions (see accompanying table). In November of last year, targeted firms had expressed to the EPA their concerns over the standards' requirements for installing VOC concentration detection equipment. They argued that these requirements created difficulty for them because this type of air pollution detection equipment was not yet available on the market. Semiconductor firms also commented that the standards placed an excessive investment burden on smaller manufacturers thereby weakening their competitiveness. They expressed the hope that the EPA would give targeted firms a buffer period by extending the implementation date of air pollution controls. At the time, the EPA took industry's request into serious consideration. As a result, the control targets of the emission standards were defined as larger scale manufacturers, and the implementation date was extended. The standards stipulate that existing facilities have three months from the date of announcement to file pollution control plans with local-level competent authorities. The EPA has also set July 1, 2000, as the date related emission standards and monitoring and reporting requirements will become effective. Semiconductor Industry Air Pollution Control Standards Air pollutants Emission standards VOCs Emissions reductions greater than 90% or total factory emissions less than 0.6 kg/hr (according to methane calculation basis) Tricholoroethylene Emissions reductions greater than 90% or total factory emissions less than 0.02 kg/hr. Nitric acid, hydrochloric acid, phosphoric acid, HF acid Emissions reductions greater than 95% or total factory emissions less than 0.6 kg/hr. Sulfuric acid Emissions reductions greater than 95% or total factory emissions less than 0.1 kg/hr. Note: Because facilities that use wet scrubber technology to treat waste gas from nitric acid, hydrochloric acid, phosphoric acid, HF acid, and sulfuric acid cannot prove compliance with the above stated standards, they should meet other process requirements.
年度
1999
月份
2
卷
2
期
8
順序
1
倒序
2
分類
air
標題2
Semiconductor Industry Air Emissions Standards Announced
檔案位置
print/V2/V2-08
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